发明名称 DEVICE AND METHOD FOR PROCESSING ELECTRIC CIRCUIT SUBSTRATES BY LASER
摘要 <p>According to the invention, a laser source (1) with a diode-pumped, goods-controlled, pulsed solid body laser is used to process electric circuit substrates. The laser radiation of said laser has a wave length of between 266 nm and 1064 nm, a pulse repetition rate of between 1 kHz and 1 MHz and a pulse length of 30 ns - 200 ns for an average laser power rate of between 0.1 W and approx. 5 W. Predetermined operational modes with correspondingly different combinations of laser power and repetition frequencies can be adjusted by controlling each application in order to selectively provide a hole operation mode, an ablation operation mode or an illumination operation mode using the same laser. The laser beam is deflected to the substrate corresponding to the respective operation mode by means of an adjustable galvo mirror deflection unit and by the control unit.</p>
申请公布号 KR20050103951(A) 申请公布日期 2005.11.01
申请号 KR20057015447 申请日期 2005.08.20
申请人 HITACHI VIA MECHANICS, LTD. 发明人 ROELANTS EDDY;LESJAK STEFAN;EDME SEBASTIEN
分类号 B23K26/38;H05K3/00;(IPC1-7):B23K26/38 主分类号 B23K26/38
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