| 发明名称 |
Method of making sub-lithographic features |
| 摘要 |
A method of forming a structure having sub-lithographic dimensions is provided. The method includes: forming a chamfered mandrel on a substrate, the mandrel having an angled surface; and performing an angled ion implantation to obtain an implanted shadow region in the substrate, the implanted shadow mask having at least one sub-lithographic dimension.
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| 申请公布号 |
US6960510(B2) |
申请公布日期 |
2005.11.01 |
| 申请号 |
US20020187579 |
申请日期 |
2002.07.01 |
| 申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
DESHPANDE SADANAND V.;FURUKAWA TOSHIHARU;HORAK DAVID V.;NATZLE WESLEY C.;SEKIGUCHI AKIHISA;TSOU LEN Y.;YANG QINGYUN |
| 分类号 |
H01L21/033;H01L21/265;H01L21/28;H01L21/308;H01L21/311;(IPC1-7):H01L21/823;H01L21/336;H01L21/823 |
主分类号 |
H01L21/033 |
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