RESIST PATTERN FORMING METHOD WITH PRECISE WIDTH THAN MASK SIZE,申请号KR19990062607-传众专利搜索

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发明名称	RESIST PATTERN FORMING METHOD WITH PRECISE WIDTH THAN MASK SIZE
摘要
申请公布号	KR100525090(B1)	申请公布日期	2005.11.01
申请号	KR19990062607	申请日期	1999.12.27
申请人		发明人
分类号	G03F7/16;G03F7/20;(IPC1-7):G03F1/08	主分类号	G03F7/16
代理机构		代理人
主权项
地址

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