发明名称 Method and apparatus for cutting devices from substrates
摘要 A method and system for cutting a wafer comprising a semiconductor substrate attached to an array of integrated devices includes placing the wafer on a stage such as a movable X-Y stage including a vacuum chuck having a porous mounting surface, and securing the wafer during and after cutting by vacuum pressure through the pores. The wafer is cut by directing UV pulses of laser energy at the substrate using a solid-state laser having controlled polarization. An adhesive membrane can be attached to the separated die to remove them from the mounting surface, or the die can otherwise be removed after cutting from the wafer.
申请公布号 US6960813(B2) 申请公布日期 2005.11.01
申请号 US20030664755 申请日期 2003.09.17
申请人 发明人
分类号 B23K26/03;B23K26/06;B23K26/08;B23K26/40;B23K26/42;B28D1/22;B28D5/00;H01L21/301;(IPC1-7):H01L27/14;H01L29/82;H01L29/84 主分类号 B23K26/03
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