发明名称 ELECTRODE STRUCTURE ON P-TYPE ? GROUP NITRIDE SEMICONDUCTOR LAYER AND FORMATION METHOD THEREOF
摘要 An electrode structure on a p-type III group nitride semiconductor layer includes first, second and third electrode layers successively stacked on the semiconductor layer. The first electrode layer includes at least one selected from a first metal group of Ti, Hf, Zr, V, Nb, Ta, Cr, W and Sc. The second electrode layer includes at least one selected from a second metal group of Ni, Pd and Co. The third electrode layer includes Au.
申请公布号 KR100525494(B1) 申请公布日期 2005.11.01
申请号 KR20000021899 申请日期 2000.04.25
申请人 发明人
分类号 H01L33/00;H01L21/285;H01L29/20;H01L29/45;H01L33/32;H01L33/40;(IPC1-7):H01L33/00 主分类号 H01L33/00
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