| 摘要 |
In a reflective-type mask blank ( 10 ) for exposure which blank includes a substrate ( 1 ) having a principal surface, a reflective multilayer film ( 2 ) formed on the principal surface, and an absorber film ( 4 ) formed on the reflective multilayer film, an intermediate layer ( 3 ) is interposed between the reflective multilayer film and the absorber film and is resistant against an etching environment of the absorber film. The intermediate layer is made of a material comprising Ta as a main metal component. The reflective multilayer film is for reflecting exposure light which travels from the outside of the reflective-type mask blank towards the principal surface. The absorber film is for absorbing the exposure light. |
