发明名称 |
Dual-counterdoped channel field effect transistor and method |
摘要 |
A field effect transistor with a dual-counterdoped channel is disclosed. The transistor features a channel comprising a first doped region ( 28 ) and a second doped region ( 26 ) underlying the first doped region. A source and drain ( 32 ) are formed adjacent to the channel. In one embodiment of the present invention, the first doped region ( 28 ) is doped with arsenic, while the second doped region ( 26 ) is doped with phosphorus. The high charge-carrier mobility of the subsurface channel layer ( 28 ) allowing a lower channel dopant concentration to be used, which in turn allows lower source/drain pocket doping. This reduces the capacitance and response time of the transistor.
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申请公布号 |
US6960499(B2) |
申请公布日期 |
2005.11.01 |
申请号 |
US20040866469 |
申请日期 |
2004.06.14 |
申请人 |
TEXAS INSTRUMENTS INCORPORATED |
发明人 |
NANDAKUMAR MAHALINGAM;VASANTH KARTHIK;CHEN IH-CHIN |
分类号 |
H01L21/265;H01L29/10;(IPC1-7):H01L21/336 |
主分类号 |
H01L21/265 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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