发明名称 |
System and method for maskless lithography using an array of improved diffractive focusing elements |
摘要 |
A maskless lithography system is disclosed that includes an array of blazed diffractive zone plates, each of which focuses an energy beam into an array of images in order to create a permanent pattern on an adjacent substrate in certain embodiments. In further embodiments, an array of apodized diffractive elements may also be used.
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申请公布号 |
US6960773(B2) |
申请公布日期 |
2005.11.01 |
申请号 |
US20030624316 |
申请日期 |
2003.07.21 |
申请人 |
MASSACHUSETTS INSTITUTE OF TECHNOLOGY |
发明人 |
MENON RAJESH;GIL DARIO;CARTER DAVID;SMITH HENRY I.;BARBASTATHIS GEORGE |
分类号 |
G03F7/20;(IPC1-7):G03F7/207 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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