| 发明名称 |
METHOD FOR COATING SUBSTRATES IN INLINE INSTALLATIONS |
| 摘要 |
<p>Coating a substrate (5) in inline installations comprises: forming a model of the coating chamber (2), which takes into consideration those changes of chamber parameters, which are caused by the movement of the substrate through the coating chamber; acquiring the position of the substrate within the coating chamber is acquired; and setting the chamber parameters are set based on the position of the substrate according to the model.</p> |
| 申请公布号 |
KR20050103450(A) |
申请公布日期 |
2005.10.31 |
| 申请号 |
KR20050007582 |
申请日期 |
2005.01.27 |
| 申请人 |
APPLIED FILMS GMBH & CO. KG |
发明人 |
KASTNER ALBERT;GEISLER MICHAEL;LEIPNITZ THOMAS;BRUCH JURGEN;PFLUG ANDREAS;SZYSZKA BERND |
| 分类号 |
H01L21/203;C23C14/00;C23C14/34;C23C14/54;C23C14/56;H01L21/00;H01L21/285;(IPC1-7):H01L21/203 |
主分类号 |
H01L21/203 |
| 代理机构 |
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代理人 |
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| 主权项 |
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