PHOTOSENSITIVE POLYMER, DISSOLUTION INHIBITOR AND CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION CONTAINING THE SAME

摘要

A PHOTOSENSITIVE POLYMER, A DISSOLUTION INHIBITOR, AND A CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION CONTAINING THE PHOTOSENSITIVE POLYMER AND THE DISSOLUTION INHIBITOR ARE PROVIDED. THE PHOTOSENSITIVE POLYMER IS A COPOLYMER POLYMERIZED WITH 5-NORBORNENE-2-METHANOL DERIVATIVE MONOMER HAVING A C1 TO C20 ALIPHATIC HYDROCARBON AS A SIDE CHAIN, AND A MALEIC ANHYDRIDE MONOMER. THE DISSOLUTION INHIBITOR IS A TRICYCLODECANE DERIVATIVE OR A SARSASAPOGENIN DERIVATIVE, EACH HAVING AN ACID-LABILE GROUP AS A FUNCTIONAL GROUP. THE CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION CONTAINING THE PHOTOSENSITIVE POLYMER AND/OR DISSOLUTION INHIBITOR HAS A STRONG RESISTANCE TO ETCHING AND EXCELLENT ADHERENCE TO THE UNDERLYING LAYER.