TEMPERATURE CONDITIONED LOAD LOCK, LITHOGRAPHIC APPARATUS COMPRISING SUCH A LOAD LOCK AND METHOD OF MANUFACTURING A SUBSTRATE WITH SUCH A LOAD LOCK

摘要

A load lock for a lithographic apparatus is arranged to transfer an object, like a substrate, into and from the lithographic apparatus. The load lock outer wall defining at least part of a load lock volume accommodating a support unit for supporting the object when in the load lock. The load lock also has a temperature conditioned structure to control the temperature of the object to a desired temperature at least before the object is transferred from the load lock towards the lithographic projection apparatus.