| 发明名称 |
LITHOGRAPHIC PROJECTION APPARATUS AND DEVICE MANUFACTURING METHOD |
| 摘要 |
Pixel element for a programmable patterning structure (e.g. a spatial light modulator) which can simultaneously modulate both phase and amplitude. Use of such a programmable patterning structure with lithographic projection apparatus is also described. |
| 申请公布号 |
SG115590(A1) |
申请公布日期 |
2005.10.28 |
| 申请号 |
SG20030006868 |
申请日期 |
2003.11.24 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
BLEEKER, ARNO, JAN |
| 分类号 |
G02F1/03;G03F1/00;G03F1/32;G03F7/20;H01L21/027 |
主分类号 |
G02F1/03 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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