| 摘要 |
PROBLEM TO BE SOLVED: To provide an apparatus and a method for a developing process in which occurrence of imprints in a substrate is suppressed. SOLUTION: The developing process unit 24 comprises a second roller transportation mechanism 14b that transports the substrate G while keeping the posture thereof almost horizontal, main developing nozzles 501a, 51b that feed a developing solution to the surface of the substrate G, a developing-solution ejection control mechanism 56 that controls the developing-solution ejection from the main developing nozzle 51a and the like, a developing-nozzle moving mechanism 55 that moves the main developing nozzle 51a and the like to prescribed directions, and a puddle formation control apparatus 57 that controls the second roller transportation mechanism 14b, the developing-solution ejection control mechanism 56, and the developing-nozzle moving mechanism 55 so as to form a developing-solution puddle on the substrate G by moving the main developing nozzle 51a and the like to the reverse direction of the substrate transportation direction while the substrate G supported by the second roller transportation mechanism 14b is rocked back and forth along the substrate transportation direction within a prescribed distance and the developing solution is ejected from the main developing nozzle 51a and the like. COPYRIGHT: (C)2006,JPO&NCIPI |
