| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an aberration measuring method which allows the easy fabrication of a sample in a short time and requires no special measuring instrument for measuring the sample and can calculate the wavefront aberration of a projection lens which corresponds to a Zernike factor in a short measuring time, and to provide an exposure apparatus using the same. <P>SOLUTION: This aberration measuring method forms the image of a test pattern on the surface of a substrate by a projection optical system, and measures the aberration of the projection optical system based on the amount of the positional deviation of the test pattern image formed on the substrate surface. The wavefront aberration is measured using a pupil region optimization means which performs the optimization of the pupil region of the projection optical system on the projection aligner side including the projection optical system, and a shading pattern which shades some of an effective light source of illumination light for illuminating the test pattern on the rear surface of the substrate whereon the test pattern is formed for measuring positional deviation. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
