发明名称 POLISHING MEDIA, METALLIC WORK POLISHING METHOD AND MAGNETIC MATERIAL
摘要 PROBLEM TO BE SOLVED: To provide polishing media for largely restraining generation of media powder being industrial waste, by providing a stable polishing quantity and superior surface processing when barrel polishing a metallic work. SOLUTION: A diamond abrasive grain 12 having the average particle size falling within a range of 10μm to 200μm is fixed by a plating film 13 to a surface of a core 11 having the average particle size of 1 mm to 20 mm. The core 11 is composed of at least one kind of construction material of WC, TiC, aluminum, titanium or rare earth metal (including yttrium), and a specific gravity of the polishing media 10 is set to 4 or less. When barrel polishing by inputting a polishing liquid suspending these polishing media 10 in a liquid medium and the metallic work in the barrel, due to being extremely low in an abrasion level of the polishing media 10, the stable polishing quantity and the superior surface processing are provided, and generation of media powder being the industrial waste can be largely restrained. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2005297117(A) 申请公布日期 2005.10.27
申请号 JP20040115832 申请日期 2004.04.09
申请人 SHIN ETSU CHEM CO LTD;SHINETSU MAGNET:KK 发明人 ARIKAWA SETSU;SEKIYA YOSHIYUKI;UNO HISAHIRO;KIYOTA KAZUYOSHI;JIBIKI TAKAFUMI
分类号 B24B31/14;(IPC1-7):B24B31/14 主分类号 B24B31/14
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