| 摘要 |
A pattern writing apparatus for writing a pattern on a photosensitive material comprises a head provided with a DMD having a micromirror group which modulates reflected light, a stage holding a substrate, and mechanisms for moving the head and the stage relative to each other. Light from the micromirrors of the DMD are directed to irradiation regions (61) on the substrate, respectively. The irradiation regions (61) are moved over the substrate with movement of the substrate relative to the head. The DMD is provided within the head so that the direction of arrangement of the irradiation regions (61) is tilted relative to the main scanning direction, and a center-to-center distance (L1) along the sub-scanning direction between two adjacent irradiation regions (61) arranged in the main scanning direction is made equal to a pitch (P1) of writing cells (620) on the substrate with respect to the sub-scanning direction. This allows multiple exposures centered about each of the writing cells (620), thereby achieving high-speed pattern writing while permitting precise control of the pattern linewidth. |
