| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To carry out a mask defect inspection in a short period of time with high accuracy. <P>SOLUTION: The apparatus is equipped with: an inspection area operation section 51 to operate the inspection area around a segment functioning to seam drawn images from the drawing data of a mask; a pixel setting section 52 to divide the inspection area operated by the inspection area operation section 51 into a plurality of pixels; a reflected image deciding section 53 to take in the reflected image on the mask surface in the inspection area and to decide whether possibility of failure is present or not in the segment; and a segment deciding section 54 to take in the translucent image of the mask in the inspection area when possibility of failure is decided to be present in the segment by the reflective image deciding section 53 and to compare the taken-in image with a preliminarily taken in reference image by each pixel unit to decide whether failure in the segment is present or not. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p> |
