MULTILAYER FILM REFLECTOR, METHOD FOR MANUFACTURING IT AND EUV EXPOSURE SYSTEM

摘要

PROBLEM TO BE SOLVED: To provide a multilayer reflector which is resistant to a deterioration in reflection properties due to oxidization.

SOLUTION: The multilayer reflector is composed by forming an Mo/Si multi-layer film 2 on a base 1 made of low-heat expansion glass whose surface is shaped aspherically and forming an MoSi2thin film 3 on the outermost surface of the film 2. The resistance of the MoSi2thin film 3 to oxidization prevents the reflectivity of the film 3 from lowering due to the oxidization of the Mo/Si multilayer film 2 when the carbon adhering to the multilayer film reflector is removed through the oxidization of it.

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