| 摘要 |
PROBLEM TO BE SOLVED: To provide a film-forming apparatus for promoting the growth of a ZnO film by introducing a decomposing gas into a treatment space, without requiring a special modification of the facility. SOLUTION: This film-forming apparatus for forming the ZnO film on the surface of an article 5 to be treated which is exposed to the treatment space 1, by supplying at least O source gas and Zn source gas to the treatment space 1 and using both of the source gases, has decomposing-gas-introducing channels 15 and 27 for introducing the decomposing gas (hydrogen gas) into the treatment space 1, which promotes decomposition of at least one of the source gases. The film-forming apparatus having such a structure decomposes the source gas and forms the adequate film; and at the same time, can simplify the structure of the apparatus itself and reduces a facility cost because it does not need a plasma source or a laser source. COPYRIGHT: (C)2006,JPO&NCIPI
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