| 摘要 |
PROBLEM TO BE SOLVED: To provide a novel manufacturing method of ultrapure water by which a process for manufacturing ultrapure water can be simplified and further a polluted aqueous solution capable of using as raw water with difficulty, for example dilute waste water containing tetraalkylammonium hydroxide (TMAH) such as a resist washing waste solution in a semiconductor plant, can be used. SOLUTION: TMAH-containing waste water is supplied to a thin film evaporation kettle 202 from the semiconductor plant 201 to obtain distilled water and the distilled water is supplied to the process for manufacturing ultrapure water through piping without coming into contact with outside air. In the process for manufacturing ultrapure water, the distilled water is successively treated by a UV light oxidation treatment apparatus 203, an ion-exchange resin apparatus 204 and a filter apparatus 205 and then is supplied to a use point 206. COPYRIGHT: (C)2006,JPO&NCIPI
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