发明名称 |
Substrate with a multilayer reflection film, reflection type mask blank for exposure, reflection type mask for exposure and methods of manufacturing them |
摘要 |
A multilayer-reflection-film-coated substrate includes a substrate, a multilayer reflection film formed on the substrate and reflecting an exposure light, and a conductive film formed on an opposite side of the substrate from the multilayer reflection film in a region excluding at least a peripheral portion of the substrate. The conductive film is made of a material containing chromium (Cr). The conductive film contains nitrogen (N) on a substrate side and at least one of oxygen (O) and carbon (C) on a surface side. A reflection type mask blank for exposure is obtained by forming an absorber film for absorbing the exposure light on the multilayer reflection film of the multilayer-reflection-film-coated substrate. A reflection type mask is obtained by forming a pattern on the absorber film of the reflection type mask blank for exposure. |
申请公布号 |
US2005238922(A1) |
申请公布日期 |
2005.10.27 |
申请号 |
US20040017873 |
申请日期 |
2004.12.22 |
申请人 |
HOYA CORPORATION |
发明人 |
KINOSHITA TAKERU;HOSOYA MORIO;SHOKI TSUTOMU |
分类号 |
B32B17/06;C03C17/34;C03C17/36;G03F1/14;G03F1/22;G03F1/24;G03F1/40;H01L21/027;(IPC1-7):B32B17/06 |
主分类号 |
B32B17/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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