| 摘要 |
PROBLEM TO BE SOLVED: To reduce processing time of an ion milling process of a magnetoresistance effect film for use in a magnetoresistance effect element, thereby improve resolution of a lead element. SOLUTION: In a method for manufacturing a magnetoresistance effect film having a specular layer 2 and a cap layer 1 formed as protection films for a magnetic layer, a metal material to be formed into the specular layer is deposited on the magnetic layer, then the specular layer 2 is formed by depositing the metal material, and then the same metal material as in the specular layer is deposited on the specular layer 2 as the cap layer. COPYRIGHT: (C)2006,JPO&NCIPI
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