发明名称 Etching system and etching method
摘要 An etching method for subjecting a single film to be etched to etching comprised of a plurality of etching steps based on respectively different recipes, includes steps of generating and fixing a recipe which is a preset recipe to be applied to an etching step of the plurality of etching steps which affects an underlying film making contact with the single film to be etched, generating different recipes other than the preset recipe to be applied to other etching steps of the plurality of etching steps, wherein at least one of the different recipes for the other etching steps is generated on the basis of processed results, and conducting etching of the single film according to the recipes generated.
申请公布号 US2005236364(A1) 申请公布日期 2005.10.27
申请号 US20050154698 申请日期 2005.06.17
申请人 KAGOSHIMA AKIRA;YOSHIGAI MOTOHIKO;YAMAMOTO HIDEYUKI;SHIRAISHI DAISUKE;TANAKA JUNICHI;TAMAKI KENJI;MORIOKA NATSUYO 发明人 KAGOSHIMA AKIRA;YOSHIGAI MOTOHIKO;YAMAMOTO HIDEYUKI;SHIRAISHI DAISUKE;TANAKA JUNICHI;TAMAKI KENJI;MORIOKA NATSUYO
分类号 H01L21/3065;H01L21/00;H01L21/3213;H01L21/66;(IPC1-7):H01L21/302 主分类号 H01L21/3065
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