COATER/DEVELOPER AND COATING/DEVELOPING METHOD

摘要

A coater/developer ensuring coating/development with high precision and high in-plane uniformity by suppressing the influence of components eluted from resist at the time of processing a substrate subjected to liquid immersion exposure. The surface of the substrate is coated with resist using a coating unit, the substrate is then cleaned using a first cleaning means such as a cleaning nozzle before exposed. Since the quantity of components eluted from the resist is small even if a liquid layer for passing light at the time of exposure is formed on the surface of the substrate, exposure can be carried out with high line width accuracy, and resultantly a resist pattern can be formed with high precision and high in-plane uniformity on the developed substrate.