RESIST COMPOSITION

摘要

A radiation-sensitive resist composition comprising a resist compound (A), an acid generator (B), and a crosslinking agent (C) capable of crosslinking the compound (A) in the presence of acid. The resist compound (A) is a polyphenol which is prepared by condensation of an aromatic ketone or aldehyde having 5 to 45 carbon atoms with a compound having one to three phenolic hydroxyl groups and 6 to 15 carbon atoms and which has a molecular weight of 300 to 5000. The resist composition exhibits high sensitivity, high resolution, high heat resistance, and solvent solubility.