发明名称 Method for manufacturing a display device including irradiating overlapping regions
摘要 A device-forming region where a semiconductor device is formed is arranged on a substrate in the matrix of 2x2. A linear laser beam has a cross-section having a length longer than the width of the device-forming region. When the irradiation of the laser beam is performed, the region irradiated with the end portions of the linear laser beams overlapped with each other or brought into contact with each other, is made positioned outside the device-forming region.
申请公布号 US2005239299(A1) 申请公布日期 2005.10.27
申请号 US20050159107 申请日期 2005.06.23
申请人 SEMICONDUCTOR ENERGY LABORATORY CO., LTD., A JAPAN CORPORATION 发明人 YAMAZAKI SHUNPEI;TANAKA KOICHIRO
分类号 B23K26/073;B23K26/08;H01L21/20;H01L21/26;H01L21/268;H01L21/77;(IPC1-7):H01L21/26 主分类号 B23K26/073
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