RADIATION-SENSITIVE RESIN COMPOSITION

摘要

Disclosed is a radiation-sensitive resin composition which is highly transparent to wavelengths not more than 193 nm and particularly suitable for a chemically amplified resist having an excellent depth of focus (DOF). In addition, sensitivity change after storage is greatly suppressed in this radiation-sensitive resin composition. The radiation-sensitive resin composition is characterized in that it contains (i) a siloxane resin having a structural unit (I) represented by the formula (I) below and/or a structural unit (II) represented by the formula (II) below, (ii) a radiation-sensitive acid generator and (iii) a solvent, and nitrogen-containing compounds other than the components (i)-(iii) are contained in the resin composition in an amount of not more than 100 ppm. (I) (II) (In the above formulae, A and B respectively represent a straight chain, branched chain or cyclic divalent (substituted) hydrocarbon group, R<1> represents a monovalent acid-cleavable group, and R<2> represents a hydrogen atom or a monovalent acid-cleavable group.)