发明名称 ELECTRON BEAM RECORDING APPARATUS, ELECTRON BEAM IRRADIATION POSITION DETECTING METHOD AND ELECTRON BEAM IRRADIATION POSITION CONTROL METHOD
摘要 PROBLEM TO BE SOLVED: To eliminate the problem, wherein with electron beam recording apparatus the variations of the position of the electron beam irradiation is very difficult to detect during the disc master recording, because the electron beam undergoes great effects, such as variations of magnetic field around the recorder as well as mechanical vibrations, acoustic noise and electrical noise of the recorder, and the position of the electron beam irradiation to the master varies. SOLUTION: An electron beam recording apparatus includes an electron optical system for irradiating the electron beam on the master of an information recording medium and a shielding plate for shielding the electron beam. An electron beam irradiation quantity detector is provided on the shielding plate and is divided into first and second electron beam detecting portions along an information recording direction on the master. A difference detector calculates the difference between a first quantity of the electron beam irradiated on the first electron beam detecting portion and a second quantity of the electron beam irradiated on the second electron beam detecting portion, such that the position of the electron beam in a direction substantially perpendicular to the information recording direction is detected from the difference. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2005302704(A) 申请公布日期 2005.10.27
申请号 JP20050059273 申请日期 2005.03.03
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 TSUKUDA MASAHIKO;ABE SHINYA
分类号 G21K5/04;G11B7/26;H01J37/04;H01J37/30;(IPC1-7):H01J37/30 主分类号 G21K5/04
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