发明名称 |
METHOD FOR MANUFACTURING PATTERN FORMING BODY |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a substrate for a pattern forming body which can be used for manufacturing of a color filter etc., and has a pattern with characteristic variation formed on its top surface efficiently to large area. <P>SOLUTION: The method for manufacturing the pattern forming body includes a process for preparing a substrate for patterning wherein the substrate for patterning having a base material and a photocatalyst-containing characteristic changing layer which is formed on the base material and contains at least a photocatalyst and a binder and whose characteristic changes through the operation of the photocatalyst accompanying energy irradiation, and an energy irradiation process of forming a characteristic changed pattern in which characteristics of the photocatalyst-containing characteristic changing layer change by irradiating the substrate for patterning with energy of 0.1 to 10 mW/cm<SP>2</SP>in intensity. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p> |
申请公布号 |
JP2005300654(A) |
申请公布日期 |
2005.10.27 |
申请号 |
JP20040112998 |
申请日期 |
2004.04.07 |
申请人 |
DAINIPPON PRINTING CO LTD |
发明人 |
KOBAYASHI HIRONORI;UNO YUSUKE |
分类号 |
G02B5/20;G03F7/00;G03F7/004;G03F7/075;H01L51/50;H05B33/10;H05B33/14;(IPC1-7):G02B5/20 |
主分类号 |
G02B5/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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