发明名称 ILLUMINATION OPTICAL SYSTEM AND EXPOSURE APPARATUS USING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide an illumination optical system capable of attaining the formation of higher NA and the enlargement of a &sigma; value variable extent by consisting of a smaller number of lenses and the smaller scale while positioning a recondensing position where light energy density is increased outside the lens and satisfying a structural constraint and the constraint of the diameter of an optical material. <P>SOLUTION: In the illumination optical system, a reimaging optical system is an exit telecentric optical system where principle rays of off-axis luminous flux are nearly collimated in an image cavity, and the system is provided with a 1st lens group having positive power, a 2nd lens group having negative power and a 3rd lens group having positive power in this order from a light incident side. Further, By arranging a concave lens on the light exit side of the 2nd lens group, and also, arranging a convex lens on the light incident side of the 3rd lens group, an intersection position where the principle ray of the off-axis luminous flux crosses the optical axis exists between the 2nd lens group and the 3rd lens group. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2005301054(A) 申请公布日期 2005.10.27
申请号 JP20040119249 申请日期 2004.04.14
申请人 CANON INC 发明人 ORINO TATEKI
分类号 G02B13/24;G02B13/14;G02B13/18;G02B13/22;G02B15/167;G03F7/20;H01L21/027 主分类号 G02B13/24
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