| 摘要 |
PROBLEM TO BE SOLVED: To provide an aluminum alloy film permitting the direct contact of the aluminum alloy film to a clear electrode and the realization of omission of a barrier metal while having resistance to corrosion against alkaline solution, a wiring structure employing the alloy film and the manufacturing method of the structure. SOLUTION: The display device is provided with a pixel electrode 5 formed of the clear electrode on an insulating substrate 1a, and a drain electrode 29 formed of the aluminum alloy film connecting electrically a thin film transistor to the pixel electrode 5. The aluminum alloy film is constituted of a multi-layered structure wherein the aluminum alloy film, not containing nitrogen, is laminated on the aluminum alloy film containing nitrogen to secure the resistance to corrosion against alkaline solution by the layer containing nitrogen. A connecting wiring unit with the pixel electrode 5 is constituted of a structure wherein the pixel electrode is directly contacted to the aluminum alloy film by removing the aluminum alloy layer containing nitrogen. COPYRIGHT: (C)2006,JPO&NCIPI |
