发明名称 Herstellung von Kationenaustauschermembran-Dünnschichten
摘要 Production of cationic exchange membrane thin layers containing sulfonic acid groups comprises using plasma deposition. Organic monomers as the starting compounds which have a boiling point of not more than 300 deg C at a pressure of 1 bar and are chemically stable at this temperature and are non corrosive. The plasma deposition is carried out in a non-pulsed plasma or in a pulsed plasma with an average power density that is 1.5 times the plasma ignition power density. Sulfonic acid groups are built into the deposited thin layer by treating with an aqueous hydrogen sulfite solution.
申请公布号 DE19911413(B4) 申请公布日期 2005.10.27
申请号 DE1999111413 申请日期 1999.03.15
申请人 INFINEON TECHNOLOGIES AG 发明人 EISELE-KOHLER, ARTUR;LEUSCHNER, RAINER;LIPINSKI, MATTHIAS
分类号 B01D67/00;B01D69/12;C08J5/22;H01M2/16;H01M8/02;H01M8/10;H01M10/05 主分类号 B01D67/00
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