发明名称 |
CHUCK FOR SPIN COATER, METHOD OF MANUFACTURING VAPOR DEPOSITION MASK AND METHOD OF MANUFACTURING ORGANIC EL DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a chuck for a spin coater suitable for supporting a body to be treated which has a resist layer formed also on the rear surface, a method of manufacturing a vapor deposition mask using the same and a method of manufacturing an organic EL device. SOLUTION: The chuck for the spin coater is used for the spin coater, holds the body W to be treated and is provided with a chuck main body 2 connected to the spin coater and a holding part 3 for holding only the outer peripheral part of the body W to be coated in such a manner that at at least the bottom surface side of the peripheral part is supported. The holding part 3 is provided to be projected from the upper surface side of the chuck main body 2. COPYRIGHT: (C)2006,JPO&NCIPI
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申请公布号 |
JP2005296705(A) |
申请公布日期 |
2005.10.27 |
申请号 |
JP20040112093 |
申请日期 |
2004.04.06 |
申请人 |
SEIKO EPSON CORP |
发明人 |
ITODA MOTOKI;YOTSUYA SHINICHI |
分类号 |
H05B33/10;B05C11/08;C23C14/24;H01L51/50;H05B33/14;(IPC1-7):B05C11/08 |
主分类号 |
H05B33/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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