发明名称 BLACK PLATING FILM DEPOSITING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a black plating film depositing method capable of uniformly depositing a black plating film on a surface of a work to be plated which is made of copper or a copper alloy. SOLUTION: A work to be plated which is made of copper or a copper alloy is immersed in an electroless plating bath of the liquid temperature being≤23°C for a predetermined time. The electroless plating bath contains nickel salt, thiouria-based compound, a tin (II) salt compound, and a chelating agent. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2005298863(A) 申请公布日期 2005.10.27
申请号 JP20040114055 申请日期 2004.04.08
申请人 JAPAN TECHNO MATE CORP 发明人 GOHARA MAKOTO
分类号 C23C18/34;(IPC1-7):C23C18/34 主分类号 C23C18/34
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