Methods for producing ruthenium film and ruthenium oxide film

摘要

To provide a method that can relatively rapidly deposit a ruthenium film that adheres well to substrate and that also does not incorporate impurities. Method for producing ruthenium film, characterized by reacting a gaseous volatile inorganic ruthenium compound with a gaseous reducing agent by introducing the gaseous volatile inorganic ruthenium compound and gaseous reducing agent into a reaction chamber ( 11 ) that holds at least one substrate and thereby depositing ruthenium on the at least one substrate.