METHOD FOR MANUFACTURING PHOTORESIST COMPOSITION, FILTERING DEVICE, COATING DEVICE AND PHOTORESIST COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a technique to obtain a photoresist composition which can suppress the occurrence of defects and excellently supress deposition of fine particles and the occurrence of contamination with time (storage stability).

SOLUTION: A photoresist composition comprising a resin component (A) having a constitutional unit (a1) represented by formula (I) (where R represents H or methyl and m represents an integer of 1-3) and a constitutional unit (a2) having an acid-dissociable dissolution inhibiting group, an acid generator component (B) and an organic solvent (C) is passed through a first filter with an uncharged first membrane having a critical surface tension of ≥70 dyn/cm.

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