| 摘要 |
PROBLEM TO BE SOLVED: To provide a thin-film manufacturing apparatus that has a simplified structure, and prevents the radiation of a catalyst to a substrate and does not give influence on film formation even if the catalyst varies in temperature, and to provide a thin-film manufacturing method. SOLUTION: A catalyst housing container provided with a reactant gas supply system and a reaction chamber provided with a material gas supply system and an inert gas supply system are provided independently, and they are connected with each other by means of a valve. When a reactant gas is not introduced to the reaction chamber, the valve is shut off to block the radiation of the heated catalyst to the substrate. Thus, even if the catalyst varies in temperature, thin films can be manufactured without being given any influence on film formation. COPYRIGHT: (C)2006,JPO&NCIPI
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