发明名称 SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor device equipped with a ferroelectric device having a large amount of polarization and good fatigue characteristics. SOLUTION: The semiconductor device includes a semiconductor substrate and a ferroelectric layer 3 provided on the semiconductor substrate and sandwiched between a lower electrode 1 and an upper electrode 5. The lower electrode includes a strontium ruthenate film 2 having the thickness of≤2 nm. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2005302788(A) 申请公布日期 2005.10.27
申请号 JP20040112466 申请日期 2004.04.06
申请人 TOSHIBA CORP 发明人 NAKAZAWA HIROSUKE
分类号 H01L21/3205;H01L21/02;H01L21/8246;H01L23/52;H01L27/105;H01L29/76;(IPC1-7):H01L27/105;H01L21/320 主分类号 H01L21/3205
代理机构 代理人
主权项
地址