| 摘要 |
PROBLEM TO BE SOLVED: To provide a heat developable photosensitive material which is unlikely to be charged and is superior in adhesiveness. SOLUTION: The heat developable photosensitive material has a photosensitive layer, containing photosensitive silver halide, an organic silver salt and a reducing agent on one surface of a support and has a backing layer, whose surface resistivity in an environment of 23°C and 55% and RH is≤1×10<SP>13</SP>Ω/cm<SP>2</SP>on the surface of the support opposite to the photosensitive layer, wherein the backing layer comprises two or more layers, a compound represented by Formula (1): M<SB>1</SB>O<SB>3</SB>S-(CF<SB>2</SB>)<SB>m</SB>-SO<SB>3</SB>M<SB>1</SB>is contained in the uppermost layer but substantially is not contained in layers other than the uppermost layer; a polyester resin is contained in the layer closest to the support; and a fluoropolymer, having a constitutional unit of a structure represented by Formula (2) in its constitutional unit, is contained in at least one of the backing layers. COPYRIGHT: (C)2006,JPO&NCIPI
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