Substrate processing device

摘要

Processing chambers ( 3 A- 3 F) for applying a process to a substrate W housed therein are provided at a periphery of a conveying chamber 2 . A conveying case ( 4 ) houses the substrate (W) in a state isolated from an outside atmosphere. The conveyance case ( 4 ) has a gate valve ( 30 ) and a transfer mechanism ( 22 ). A conveying mechanism ( 5 ) supports the conveyance case 4 , and carries the conveyance case ( 4 ) to a position for conveying in/conveying out a substrate. The number of processing chambers connectable to a conveying chamber is not limited, and conveyance to the processing chamber can be executed while maintaining a predetermined ambience for an atmosphere of a substrate that is to be processed.