发明名称 Method and apparatus of depositing low temperature inorganic films on plastic substrates
摘要 A method and apparatus for depositing a low temperature inorganic film onto large area plastic substrates are described in this invention. Low temperature (<80° C.) inorganic films do not adhere very well to the plastic substrate. Therefore, a low temperature (<80° C.) plasma pre-treatment is added to improve the adhesion property. The inorganic film with plasma pre-treatment shows good adhesion and hermetic properties.
申请公布号 US2005238816(A1) 申请公布日期 2005.10.27
申请号 US20040831407 申请日期 2004.04.23
申请人 HOU LI;WON TAE K 发明人 HOU LI;WON TAE K.
分类号 C23C16/02;C23C16/30;C23C16/34;C23C16/40;C23C16/505;(IPC1-7):H05H1/24 主分类号 C23C16/02
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