POSITIVE RESIST COMPOSITION AND PROCESS FOR THE FORMATION OF RESIST PATTERNS

摘要

A positive resist composition comprising (A) a resin component and (B) an acid generator component, wherein the resin component (A) is a copolymer comprising structural units (a1) derived from an (alpha-lower alkyl)acrylic ester having an acid -dissociable dissolution-inhibiting group containing a mono- or poly-cyclic group, structural units (a2) derived from an (alpha-lower alkyl)acrylic ester having a lactone ring, structural units (a3) derived from an (alpha-lower alkyl)acrylic ester having a polycyclic group containing a polar group, and structural units (a4) represented by the general formula (1).