发明名称 METHOD FOR MANUFACTURING HIGH HEAT-RESISTANT QUARTZ GLASS
摘要 <p>Disclosed is a method for manufacturing high heat resistant quartz glass. Specifically, a method for manufacturing high heat resistant quartz glass used for a high temperature Poly-Si TFT-LCD substrate and in a semiconductor process, wherein OH group is removed by rapidly cooling the silica under vacuum.</p>
申请公布号 WO2005099357(A1) 申请公布日期 2005.10.27
申请号 WO2004KR00844 申请日期 2004.04.13
申请人 SEBIT CO., LTD;OH, HAN-SEOG;KIM, SHIN;PARK, SUNG-EUN 发明人 OH, HAN-SEOG;KIM, SHIN;PARK, SUNG-EUN
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