| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a thermal decomposition type waste gas treating device capable of efficiently treating even stable gas such as gaseous fluorocarbon, especially CF4, C2F6, etc. SOLUTION: This waste gas treating device 46 for treating the waste gas discharged from a waste gas source by a vacuum pump 44 is provided with a decomposition chamber 58 whose inlet part is connected to a discharge port of a first vacuum pump, a metallic heating element 66 arranged at its inside, a coil antenna 60 arranged at the chamber outer periphery, a power source 64 for applying high-frequency electric power to the coil antenna, an oxygen supply means 68 for supplying oxygen-containing gas to the inside of the chamber and a second vacuum pump 52 connected to a discharge port of the chamber. In this constitution, the plasma by inductive coupling is formed at the inside of the decomposition chamber and also the heating element is heated conductively. Therefore, the waste gas is decomposed thermally by the heat from the heating element and decomposed directly by the plasma.</p> |
