发明名称 |
Patterning process and resist overcoat material |
摘要 |
<p>In an immersion lithography process, a pattern is formed by forming a photoresist layer on a wafer, forming a protective coating on the photoresist layer from a resist overcoat material, exposing the layer structure to light in water, and developing. A water-insoluble, alkali-soluble material is used as the resist overcoat material.</p> |
申请公布号 |
EP1589377(A2) |
申请公布日期 |
2005.10.26 |
申请号 |
EP20050252395 |
申请日期 |
2005.04.18 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
HATAKEYAMA, JUN;HARADA, YUJI |
分类号 |
G03F7/11;G03F7/20;(IPC1-7):G03F7/20 |
主分类号 |
G03F7/11 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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