发明名称 SOI STRUCTURE COMPRISING SUBSTRATE CONTACTS ON BOTH SIDES OF THE BOX, AND METHOD FOR THE PRODUCTION OF SUCH A STRUCTURE
摘要 Disclosed are an arrangement and a production method for electrically connecting ( 20 ) active semiconductor structures ( 40 ) in the monocrystalline silicon layer ( 12 ) located on the front face of silicon-on-insulator semiconductor wafers (SOI; 10 ) to the substrate ( 13 ) located on the rear side and additional structures ( 13 a) that are disposed therein. The electric connection is made through the insulator layer ( 11 ).
申请公布号 EP1588418(A1) 申请公布日期 2005.10.26
申请号 EP20040706606 申请日期 2004.01.30
申请人 X-FAB SEMICONDUCTOR FOUNDRIES AG 发明人 RICHTER, STEFFEN;NUERNBERGK, DIRK;GOETTLICH, WOLFGANG
分类号 H01L21/84;H01L27/12 主分类号 H01L21/84
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