发明名称 |
Semiconductor integrated circuit device and method of manufacturing the same |
摘要 |
A semiconductor integrated circuit device includes a cell transistor; a bit line provided above the cell transistor; a magnetoresistive element provided above the bit line, a first end portion of the magnetoresistive element being electrically connected to the bit line; an intracell local interconnection provided above the magnetoresistive element, the intracell local interconnection coupling one of source and drain regions of the cell transistor to a second end portion of the magnetoresistive element; and a write word line provided above the intracell local interconnection, a portion between the write word line and the intracell local interconnection being filled with an insulator alone.
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申请公布号 |
US6958932(B2) |
申请公布日期 |
2005.10.25 |
申请号 |
US20020199176 |
申请日期 |
2002.07.22 |
申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
HOSOTANI KEIJI;ASAO YOSHIAKI;SAITO YOSHIAKI;AMANO MINORU;TAKAHASHI SHIGEKI;KISHI TATSUYA;IWATA YOSHIHISA |
分类号 |
H01L27/105;H01L21/768;H01L21/8246;H01L27/22;H01L43/08;(IPC1-7):G11C17/14 |
主分类号 |
H01L27/105 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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