Compensatieraamwerk voor de opname van een substraat.

摘要

The frame (2) has an inner contour for holding a substrate (1), a region (3a) of an upper main surface at a defined height above the substrate in the frame and a further region (3b) at essentially the same height as the plane of the upper main surface (1a) of the substrate in the frame. The inner profile is polygonal for accommodating the substrate and the further area of the upper main surface of the frame has different widths at different points.