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发明名称
METHOD FOR FORMATING COPPER DIFFUSION PREVENTION FILM IN SEMICONDUCTOR
摘要
申请公布号
KR100523615(B1)
申请公布日期
2005.10.24
申请号
KR20030060871
申请日期
2003.09.01
申请人
发明人
分类号
H01L21/28;(IPC1-7):H01L21/28
主分类号
H01L21/28
代理机构
代理人
主权项
地址
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