发明名称 PHOTOSENSITIVE COMPOSITION AND PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE MATERIAL
摘要 <P>PROBLEM TO BE SOLVED: To provide a negative photopolymerizable composition not causing fogging due to leakage light and having high sensitivity when the composition is exposed with a scanning exposure device using a laser which emits light at about 830 nm, and to provide a lithographic printing plate material using the composition. <P>SOLUTION: The photosensitive composition contains a sensitizing dye which imparts sensitivity in a wavelength region between 700 and 900 nm and a desensitizing dye which has absorption in the wavelength region and reduces sensitivity. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2005292409(A) 申请公布日期 2005.10.20
申请号 JP20040106306 申请日期 2004.03.31
申请人 MITSUBISHI PAPER MILLS LTD 发明人 ARAKI YUTAKA
分类号 G03F7/004;C08F2/50;C08F20/00;G03F7/00;G03F7/027;G03F7/029 主分类号 G03F7/004
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