发明名称 |
PHOTOSENSITIVE COMPOSITION AND PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE MATERIAL |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a negative photopolymerizable composition not causing fogging due to leakage light and having high sensitivity when the composition is exposed with a scanning exposure device using a laser which emits light at about 830 nm, and to provide a lithographic printing plate material using the composition. <P>SOLUTION: The photosensitive composition contains a sensitizing dye which imparts sensitivity in a wavelength region between 700 and 900 nm and a desensitizing dye which has absorption in the wavelength region and reduces sensitivity. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
申请公布号 |
JP2005292409(A) |
申请公布日期 |
2005.10.20 |
申请号 |
JP20040106306 |
申请日期 |
2004.03.31 |
申请人 |
MITSUBISHI PAPER MILLS LTD |
发明人 |
ARAKI YUTAKA |
分类号 |
G03F7/004;C08F2/50;C08F20/00;G03F7/00;G03F7/027;G03F7/029 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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